Friday, September 22

Multiscale Modeling: Fundamentals and Applications

10:30 AM-12:30 PM

Modeling of physico-chemical phenomena over multiple, interconnected length and time scales is emerging as one of the most challenging mathematical and computational challenges for the new decade. Integration of quantum mechanics results in molecular and continuum models, and of molecular (microscopic) with continuum (macroscopic scale) models, and with plant scale operations, is at the heart of this effort. Areas of application include, but are not limited to reactors, biology, and materials growth. These topics evolve so rapidly and in numerous directions, that a more formal gathering of experts in Applied Mathematics, Physics, Materials, Chemistry, Biology, and Chemical Engineering from academic institutions and industry, will be of great interest to all aforementioned fields.

Organizers: Dionisios G. Vlachos and Markos Katsoulakis
University of Massachusetts, Amherst, USA
10:30-10:55 Multiscale Modelling in Materials, Image Processing and Computer Vision Using Level Set Method
Stanley Osher, University of California, Los Angeles, USA
11:00-11:25 Mesoscopic Modeling of Nanoscale Pattern Formation in Surface Chemical Reactions
Michael Hildebrand and Alexander S. Mikhailov, Fritz-Haber-Institut der Max-Planck-Gesellschaft, Germany
11:30-11:55 Multiscale Modeling of Electromechanically-induced Failure in Metallic Thin Films Used in Microelectronics
Dimitrios Maroudas and M. Rauf Gungor, University of California, Santa Barbara, USA
12:00-12:25 Multiscale Reaction Engineering in the Chemical Industry
Jan J. Lerou, DuPont Nylon Intermediates Research and Development, USA

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