Monday, May 22

Instabilities During Growth of Thin Films

5:45 PM-6:45 PM
Room: Independence B
Chair: Jack Thiesen, TAI, USA

5:45-6:00 A Model for Limiting Thickness in Low-Temperature Epitaxial Growth
Jack Thiesen, TAI, USA; and R. S. Crandall, NREL, USA
6:05-6:20 A Variational Approach for Computing Stress Driven Instabilities in Heteroepitaxial Crystalline Films
Eric Bonnetier, CNRS-CMAP Ecole Polytechnique, France; and Antonin Chambolle, CNRS-Ceremade Université de Paris-Dauphine, France
6:25-6:40 Implementation of the System of Experiment Design and Taboo Search into SiON Thin Film Technology
Igor A. Popov, Andre Van Calster, Johan De Baets, and Herbert De Pauw, ELIS-TFCG/IMEC, State University of Ghent, Belgium

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